Nanoprocessing and nanoanalysis of functional devices by FIB

Meeting held at University of Sheffield, 1st March 2004

Oral Programme:

Please click on author for an MS Word version of abstract.

10.00 Registration, Tea and Coffee
10.25 Welcome: Dr B J Inkson

Session One - Chair: Dr B J Inkson

10.30 Dr E Zschech - AMD Saxony LLC & Co. KG.
FIB applications in semiconductor industry's failure analysis labs.
11.00 Dr H Bender - IMEC
FIB studies of advanced devices.
11.30 Dr M G Blamire - Cambridge University
Planar and heterostructure device fabrication with FIB.
12.00 Dr J M Gregg - Queens University Belfast
FIB processing of ferroelectric single crystal thin film capacitors - separating intrinsic and extrinsic effects of reduced dimension on functional properties.

12.30 Lunch and Poster Session

Session Two - Chair: Prof. A G Cullis

13.30 Dr A Portavoce - University of Virginia/IBM Research Division
Engineering of Ge dot nucleation using Ga focused ion beam.
14.00 Dr T Gemming - Leibniz-Institute for Solid State and Materials Research
Microstructure of metallization for DC and AC applications
14.30 Dr D M Donnet - Philips Semiconductors
FIB applications for advanced semiconductor failure analysis.
15.00 Dr J Walker - NDS Ltd
Unto the breach: using FIB to attack smart card chips.

15.30 Tea and Coffee / Poster Session

Session Three - Chair: Dr I M Ross

15.50 Dr N Peng - University of Surrey
Development of sub-100nm scale proton beam writing capability at Surrey ion beam centre.
16.10 Dr T Kamino - Hitachi Science Systems Ltd
Development of a sample preparation technique for site specific high resolution 3D TEM observations.
16.30 Dr Z Huang - Cranfield University
Combining Ar ion milling with FIB lift-out techniques to prepare high quality site specific TEM cross section samples.
16.50 Dr S Kleindiek - Kleindiek Nanotechnik GmbH
Secure manipulation of TEM lammellae produced by FIB milling.

17.10 Close of Meeting.

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